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boron n implanted silicon 注硼硅
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In addition, the transient enhanced diffusion during the rapid annealing of boron implanted silicon has also been discussed.
本文还讨论了瞬态退火过程中的增强扩散效应。
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In this paper, thermal post-treatment for infrared rapid isothermal annealed boron-implanted silicon was studied.
本文研究了硼离子注入硅经红外辐照退火后的热处理特性。
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