The distribution of the extraction apertures is made to compensate the Gaussan of the ion beam current density.
使引出孔的分布补偿束电流密度的高斯分布。使参数匹配并实行程序控制。
The invention provides an ion pipe with a plurality of ion beam extraction holes, so that the ion beam current density becomes uniform.
本发明提供一种排列有多个离子束引出孔的离子管，使得离子束电流密度变得均匀。
The invention provides an ion pipe and ion beam extraction method, wherein the ion pipe is arranged with a plurality of ion beam extraction holes, so that the ion beam current density becomes uniform.
本发明提供一种离子管及离子束的引出方法，离子管排列有多个离子束引出孔，使得离子束电流密度变得均匀。
The invention provides an ion pipe and ion beam extraction method, wherein the ion pipe is arranged with a plurality of ion beam extraction holes, so that the ion beam current density becomes uniform.
本发明提供一种离子管及离子束的引出方法，离子管排列有多个离子束引出孔，使得离子束电流密度变得均匀。
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