high voltage pulsed discharge plasma 高压脉冲放电等离子体
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
Effects of some factors were studied on the degradation of 4 chlorophenol in wastewater by pulsed high voltage discharge plasma.
考察了多种因素对高压脉冲放电低温等离子体法降解废水中4 -氯酚的影响。
The characters of waste water treatments using dielectric barrier discharge, pulsed high direct voltage discharge and contact glow-discharge cold plasma are analyzed.
分析了无声放电法、高压脉冲直流放电法和接触辉光放电法低温等离子体直接处理废水技术的特点。
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