目前，CMP的抛光液通常使用纳米级颗粒来加速切除和优化抛光质量。
Currently, the slurries used in CMP usually contain particles at nano scale to accelerate the material remove ratio (MRR) and to optimize the planarity.
研究由失效磷酸基抛光液直接制备纳米锥冰晶石新工艺。
A novel technology on direct preparation of nanometer chiolite from expired phosphoric acid-based polishing agent is investigated.
应用推荐